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Proceedings Paper

Deep-ultraviolet scatterometry for nanoparticle detection
Author(s): Benjamin D. Buckner; E. Dan Hirleman
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Paper Abstract

The detection of surface particles is an important part of contamination control in semiconductor manufacturing. However, the minimum particle size required to be detected has been becoming smaller as integrated-circuit geometries shrink. Current visible-light detection systems can detect particles down to around 50 nm in polystyrene-latex-equivalent size and so are adequate for current geometries, but in the near future even particles as small as around 20 nm in diameter will become significant contaminants. This is beyond the capability of current visible-light scanners, but previous work has shown that deep UV scattering by such particles should be sufficient to enable their detection. Consequently, we have constructed a deep/vacuum UV scatterometer capable of measuring scattering from semiconductor samples.

Paper Details

Date Published: 23 August 2000
PDF: 11 pages
Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); doi: 10.1117/12.410083
Show Author Affiliations
Benjamin D. Buckner, Arizona State Univ. (United States)
E. Dan Hirleman, Purdue Univ. (United States)

Published in SPIE Proceedings Vol. 4182:
Process Control and Diagnostics
Michael L. Miller; Kaihan A. Ashtiani, Editor(s)

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