Share Email Print

Proceedings Paper

Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool
Author(s): Pierre Boher; Christopher Pickering; Alexandre Tarnowka; Jean-Philippe Piel; Patrick Evrard; Jean-Louis P. Stehle
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

This paper reports progress on the integration of spectroscopic ellipsometry (SE) in the cool-down chamber of an applied materials Epi Centura Cluster System. It has been shown that new spectroscopic ellipsometer can measure wafers through a window with non-normal incidence. Correction procedures have been established and tested with measurements on standard oxide samples. Strained SiGe layers can be characterized in terms of Ge content and layer thickness indicating the feasibility of the integrate metrology technique. Further measurements are in progress with the system installed in a fully operating cluster tool. Future work will focus on improving the throughput by, for instance, rapid spectral data acquisition and application of novel algorithms to extract layer parameters during the automatic cool-down sequence.

Paper Details

Date Published: 23 August 2000
PDF: 9 pages
Proc. SPIE 4182, Process Control and Diagnostics, (23 August 2000); doi: 10.1117/12.410067
Show Author Affiliations
Pierre Boher, SOPRA SA (France)
Christopher Pickering, Defence Evaluation and Research Agency Malvern (United Kingdom)
Alexandre Tarnowka, Defence Evaluation and Research Agency Malvern (United Kingdom)
Jean-Philippe Piel, SOPRA SA (France)
Patrick Evrard, SOPRA SA (France)
Jean-Louis P. Stehle, SOPRA SA (France)

Published in SPIE Proceedings Vol. 4182:
Process Control and Diagnostics
Michael L. Miller; Kaihan A. Ashtiani, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?