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Proceedings Paper

Multilayer reflectance during exposure to EUV radiation
Author(s): Sebastian Oestreich; Roman Klein; Frank Scholze; Jeroen Jonkers; Eric Louis; Andrey E. Yakshin; Peter C. Goerts; Gerhard Ulm; Markus Haidl; Fred Bijkerk
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Paper Abstract

Mo/S multilayer mirrors have been exposed to intense monochromatic EUV radiation in order to investigate a possible deterioration of the mirror reflectance under different vacuum conditions. Power densities up to 3 mW/mm2 were applied at the PB undulator beamline at BESSY II, applying a hydrocarbon enriched vacuum. The mirror reflectance has been monitored in situ during several hours of exposure. Vacuum pressures of 3 X 10-8 mbar (without hydrocarbons) and 10-7 mbar (with hydrocarbons) at EUV intensities of 3 mW/mm2, respectively 0.2 mW/mm2 have been applied. The reflectance of the mirrors decreased when exposed to EUV radiation in hydrocarbon enriched vacuum, while no loss in reflectance was observed when no hydrocarbons were added to the vacuum. Ozone-cleaning experiments, using UV produced ozone from air at atmospheric pressure, were performed and show that Mo/S mirrors do not suffer from prolonged exposure to ozone.

Paper Details

Date Published: 8 November 2000
PDF: 8 pages
Proc. SPIE 4146, Soft X-Ray and EUV Imaging Systems, (8 November 2000); doi: 10.1117/12.406677
Show Author Affiliations
Sebastian Oestreich, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Roman Klein, Physikalisch-Technische Bundesanstalt (Germany)
Frank Scholze, Physikalisch-Technische Bundesanstalt (Germany)
Jeroen Jonkers, Philips Research Labs. (Germany)
Eric Louis, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Andrey E. Yakshin, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Peter C. Goerts, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)
Gerhard Ulm, Physikalisch-Technische Bundesanstalt (Germany)
Markus Haidl, Carl Zeiss (Germany)
Fred Bijkerk, FOM-Institute for Plasma Physics Rijnhuizen (Netherlands)

Published in SPIE Proceedings Vol. 4146:
Soft X-Ray and EUV Imaging Systems
Winfried M. Kaiser; Richard H. Stulen, Editor(s)

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