Share Email Print
cover

Proceedings Paper

Pulsed laser deposition of lithium niobate thin films
Author(s): L. Canale; C. Girault-Di Bin; F. Cosset; A. Bessaudou; A. Celerier; J.-Louis Decossas; J.-C. Vareille
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Pulsed laser deposition of Lithium Niobate thin films onto sapphire (0001) substrates is reported. Thin films composition and structure have been determined using Rutherford Backscattermg Spectroscopy (RBS) and X-ray diffraction ( XRD) experiments. The influe:nce of deposition parameters such as substrate temperature, oxygen pressure and target to substrate distance on the composition and the structure of the films has been studied. Deposition temperature is found to be an important parameter which enables us to grow LiNbO3 films without the Li deficient phase LiNb3O8. Nearly stoichiometric thin fihns have been obtained for an oxygen pressure of 0. 1 Ton and a substrate temperature of 800°C. Under optimized conditions the (001) preferential orientation of growth, suitable for most optical applications, has been obtained.

Paper Details

Date Published: 15 December 2000
PDF: 7 pages
Proc. SPIE 4087, Applications of Photonic Technology 4, (15 December 2000); doi: 10.1117/12.406370
Show Author Affiliations
L. Canale, IRCOM (France)
C. Girault-Di Bin, IRCOM (France)
F. Cosset, IRCOM (France)
A. Bessaudou, IRCOM (France)
A. Celerier, IRCOM (France)
J.-Louis Decossas, IRCOM (France)
J.-C. Vareille, IRCOM (France)


Published in SPIE Proceedings Vol. 4087:
Applications of Photonic Technology 4
Roger A. Lessard; George A. Lampropoulos, Editor(s)

© SPIE. Terms of Use
Back to Top