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Proceedings Paper

Micropinch x-ray source and its applications
Author(s): Anatoliy E. Gurey; Oleg G. Semyonov; Adolf A. Tikhomirov
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Paper Abstract

An experimental model of an industrial micropinch x-ray source is described on the basis of a low inductance vacuum spark. It was designed and tested for applications in x-ray lithography, x-ray microscopy, surface processing (micro-relief leveling) and structural modification of thin dielectric layers. The error analysis of proximity method and test results confirmed the adequacy of its application to produce microchips for the microelectronic industry with spatial resolution of < 0.1 (mu) . The x-ray microscopy of human and rabbit blood and tissue cells was performed using the proximity shadow printing method with the sensitive polymer detectors or resists.

Paper Details

Date Published: 2 November 2000
PDF: 9 pages
Proc. SPIE 4144, Advances in Laboratory-based X-Ray Sources and Optics, (2 November 2000); doi: 10.1117/12.405902
Show Author Affiliations
Anatoliy E. Gurey, P.N. Lebedev Physical Institute (Russia)
Oleg G. Semyonov, Advanced Laser and Fusion Technology, Inc. (United States)
Adolf A. Tikhomirov, P.N. Lebedev Physical Institute (Russia)

Published in SPIE Proceedings Vol. 4144:
Advances in Laboratory-based X-Ray Sources and Optics
Carolyn A. MacDonald; Ali M. Khounsary, Editor(s)

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