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Proceedings Paper

395-nm and 790-nm femtosecond laser ablation of aluminum-doped zinc oxide
Author(s): Masayuki Okoshi; Kouji Higashikawa; Mitsugu Hanabusa
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Paper Abstract

We used 395-nm and 790-nm femtosecond laser pulses to deposit aluminum-doped zinc oxide films by pulsed laser deposition. Electrical resistivity of the films was lowered (5.6 x 104(Omega) cm) at 200 degree(s)C for the 395-nm laser pulses, while maintaining the optical transparency. In addition, the deposition rate increased six times. Optical emission was measured to compare the plumes generated by 395-nm and 790-nm laser pulses. We found that the emission from ions was suppressed relative to neutral atoms. Also the kinetic energy of ejected species was nearly doubled for the 395-nm laser pulses.

Paper Details

Date Published: 6 November 2000
PDF: 4 pages
Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); doi: 10.1117/12.405719
Show Author Affiliations
Masayuki Okoshi, Toyohashi Univ. of Technology (Japan)
Kouji Higashikawa, Toyohashi Univ. of Technology (Japan)
Mitsugu Hanabusa, Toyohashi Univ. of Technology (Japan)

Published in SPIE Proceedings Vol. 4088:
First International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Koji Sugioka; Thomas W. Sigmon, Editor(s)

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