Share Email Print

Proceedings Paper

High-efficiency microdrilling of silicon wafer using excimer laser
Author(s): Shinsuke Asada; Tomokazu Sano; Isamu Miyamoto
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Drilling rate of thin silicon wafer of 50(mu) thickness was determined as a function of beam diameter and laser fluence of KrF excimer laser with a pulse width of approximately 30ns FMHW. Analysis of drilling process indicated that decreasing beam diameter and laser fluence enhanced the drilling rate with improved quality of the drilled hole. The extent of debris and molten particles ejected from the hole was also reduced as the laser fluence was decreased. The drilling rate, approximately 0.6(mu) per pulse at beam diameters larger than 100(mu) , increased significantly as the beam diameter decreased especially below 20(mu) , reaching approximately as large as 4(mu) per pulse at 10(mu) in diameter under constant laser fluence. On the other hand, only very small increase in drilling rate was observed as the laser fluence was increased. A simple formula was derived where the drilling rate is proportional to the fourth root of the laser fluence and inversely proportional to the square root of the beam diameter, assuming that the silicon is removed in a liquid state out of the hole.

Paper Details

Date Published: 6 November 2000
PDF: 4 pages
Proc. SPIE 4088, First International Symposium on Laser Precision Microfabrication, (6 November 2000); doi: 10.1117/12.405699
Show Author Affiliations
Shinsuke Asada, Osaka Univ. (Japan)
Tomokazu Sano, Osaka Univ. (Japan)
Isamu Miyamoto, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 4088:
First International Symposium on Laser Precision Microfabrication
Isamu Miyamoto; Koji Sugioka; Thomas W. Sigmon, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?