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Proceedings Paper

Structural and optical properties of TiO2-SiO2 composite films deposited by chemical vapor deposition at low-SiO2-content region
Author(s): Jeong-Hoon Park; WoonJo Cho; KugSun Hong
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Paper Abstract

We, here, present the study on the crystalline behavior of TiO2 in the presence of SiO2 and its optical property at low SiO2 content region from x equals 0 and 0.12 in the (1-x)TiO2-xSiO2 system. From X-ray diffraction, it is observed that just a small addition of SiO2 into TiO2-SiO2 films has made a rutile peak completely vanish. Anatase peaks were decreased in intensity and broadened with the increase in added SiO2 content. Besides, anatase peak was shifted to the large d-spacing and its means that Si ions have incorporated into TiO2. However, the anatase peak shift was saturated above 8 mol%. These facts confirmed that incorporated Si ions inhibited the phase transition between the rutile and the anatase and the crystallization of anatase is also suppressed with SiO2 addition. The anatase band frequency (approximately 140 cm-1) shift to the higher one in Raman spectra and the appearance of the band due to Si-O-Ti vibration in IR spectra indicates clearly that the SiO2 incorporation happens as SiO2 is added in films. The surface topography observed by SEM and AFM shows that the surface becomes smooth and the TiO2 crystallite become smaller with increasing SiO2 content. UV-Visible transmittance spectra showed that all films have good transparency up to about 90% in visible region.

Paper Details

Date Published: 25 October 2000
PDF: 9 pages
Proc. SPIE 4102, Inorganic Optical Materials II, (25 October 2000); doi: 10.1117/12.405271
Show Author Affiliations
Jeong-Hoon Park, Seoul National Univ. (South Korea)
WoonJo Cho, Korea Institute of Science and Technology (South Korea)
KugSun Hong, Seoul National Univ. (South Korea)

Published in SPIE Proceedings Vol. 4102:
Inorganic Optical Materials II
Alexander J. Marker III; Eugene G. Arthurs, Editor(s)

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