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Proceedings Paper

Tools and processes for MEMS and nanotechnology
Author(s): Philip D. Prewett; Syed Ejazu Huq; M. C. L. Ward
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Paper Abstract

Research into Microelectromechanics (MEMS) and Nanotechnology covers the range of feature dimensions from submillimeter to nanometer scales. It relies upon tools and processes for lithography and pattern transfer drawn largely but not exclusively from the silicon semiconductor industry. Optical lithography systems, particle beam nanowriter tools and X-ray sources may be regarded as the `machine tools' for MEMS and Nanotechnology, each with their unique advantages and limitations. They are being exploited for R&D applications ranging from customized MEMS to vacuum microelectronics and novel nanotools such as electron microcolumns and multiple tip scanning probe systems.

Paper Details

Date Published: 20 October 2000
PDF: 9 pages
Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); doi: 10.1117/12.404911
Show Author Affiliations
Philip D. Prewett, Univ. of Birmingham (United Kingdom)
Syed Ejazu Huq, Rutherford Appleton Lab. (United Kingdom)
M. C. L. Ward, Univ. of Birmingham (United Kingdom)

Published in SPIE Proceedings Vol. 4230:
Micromachining and Microfabrication
Kevin H. Chau; M. Parameswaran; Francis E.H. Tay, Editor(s)

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