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Proceedings Paper

Preparation of crystalline TiNi shape-memory alloy thin film for MEMS applications
Author(s): Yongqing Fu; Hejun Du; Weiming Huang; Xu Huang; Jianmin Miao; Yong Liu
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Paper Abstract

Thin film shape-memory alloys have been recognized as a promising and high performance material in the field of microelectromechanical systems applications. In this investigation, TiNi films were prepared by sputtering Ti and Ni target in argon gas using a magnetron sputtering system. Chemical composition, crystallography, microstructure and phase transformation behaviors of the deposited TiNi film were studied. Differential scanning calorimeter results showed that a two-stage transformation occurs in a sequence of monoclinic martensitic phase to rhombohedral phase, then to B2 phase upon heating, and vice versa on cooling. X-ray diffraction analysis also revealed the crystalline structure changes with the change of the temperatures. Nano- indentation reveals the elastic modulus of the film is about 5.11 GPa and the film intrinsic hardness is 2.84 +/- 0.5 GPa. By depositing TiNi films on the bulk micromachined Si cantilever structures, we obtained micro-grippers exhibiting a good shape-memory effect.

Paper Details

Date Published: 20 October 2000
PDF: 7 pages
Proc. SPIE 4230, Micromachining and Microfabrication, (20 October 2000); doi: 10.1117/12.404895
Show Author Affiliations
Yongqing Fu, Nanyang Technological Univ. (Singapore)
Hejun Du, Nanyang Technological Univ. (Singapore)
Weiming Huang, Nanyang Technological Univ. (Singapore)
Xu Huang, Nanyang Technological Univ. (Singapore)
Jianmin Miao, Nanyang Technological Univ. (Singapore)
Yong Liu, Nanyang Technological Univ. (Singapore)

Published in SPIE Proceedings Vol. 4230:
Micromachining and Microfabrication
Kevin H. Chau; M. Parameswaran; Francis E.H. Tay, Editor(s)

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