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Proceedings Paper

Optical emission diagnostics of glow discharge plasma for the carbon nitride growth process
Author(s): Wei Yu; Shu-Fang Wang; Xiao-Wei Li; Lianshui Zhang; Guangsheng Fu
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Paper Abstract

In this paper Plasma diagnostics are performed during dc glow discharge plasma-enhanced chemical vapor deposition of carbon nitride thin films using optical emission spectroscopy. The influence of the experimental parameters such as percentage of H2, discharge current and total gas pressure on the emission intensities of the excited species in the plasma is investigated. Based on these results, the excitation mechanism of these species is discussed to gain understanding of the influence of the experiment parameters on the deposition process.

Paper Details

Date Published: 9 October 2000
PDF: 4 pages
Proc. SPIE 4221, Optical Measurement and Nondestructive Testing: Techniques and Applications, (9 October 2000); doi: 10.1117/12.402652
Show Author Affiliations
Wei Yu, Hebei Univ. (China)
Shu-Fang Wang, Hebei Univ. (China)
Xiao-Wei Li, Hebei Univ. (China)
Lianshui Zhang, Hebei Univ. (China)
Guangsheng Fu, Hebei Univ. (China)

Published in SPIE Proceedings Vol. 4221:
Optical Measurement and Nondestructive Testing: Techniques and Applications
FeiJun Song; Frank Chen; Michael Y.Y. Hung; H.M. Shang, Editor(s)

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