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Proceedings Paper

Microsystems for diverse applications using recently developed microfabrication techniques
Author(s): Laurent Dellmann; Terunobu Akiyama; Danick Briand; Sebastien Gautsch; Olivier T. Guenat; Benedikt Guldimann; Philippe Luginbuhl; Cornel Marxer; Urs Staufer; Bart van der Schoot; Nico F. de Rooij
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Paper Abstract

The continuous progress in micro- and nano-system technologies has allowed the successful development of many innovative products in process control, environmental monitoring, healthcare, automotive and aerospace as well as information processing systems. In this paper on overview will be given of current progress in micro- and nanofabrication process technologies, such as deep reactive ion etching, micro-electro discharge machining, thick photoresistant processing and plating. The availibility of these micro- and nanofabrication processes will be illustrated with examples of new generations of silicon-based sensors, actuators and Microsystems with a particular emphasis on real applications of these components and systems.

Paper Details

Date Published: 11 August 2000
PDF: 12 pages
Proc. SPIE 4175, Materials and Device Characterization in Micromachining III, (11 August 2000); doi: 10.1117/12.395608
Show Author Affiliations
Laurent Dellmann, Univ. of Neuchatel (Switzerland)
Terunobu Akiyama, Univ. of Neuchatel (Switzerland)
Danick Briand, Univ. of Neuchatel (Switzerland)
Sebastien Gautsch, Univ. of Neuchatel (Switzerland)
Olivier T. Guenat, Univ. of Neuchatel (Switzerland)
Benedikt Guldimann, Univ. of Neuchatel (Switzerland)
Philippe Luginbuhl, Univ. of Neuchatel (Switzerland)
Cornel Marxer, Univ. of Neuchatel (Liechtenstein)
Urs Staufer, Univ. of Neuchatel (Switzerland)
Bart van der Schoot, Univ. of Neuchatel (Switzerland)
Nico F. de Rooij, Univ. of Neuchatel (Switzerland)

Published in SPIE Proceedings Vol. 4175:
Materials and Device Characterization in Micromachining III
Yuli Vladimirsky; Philip J. Coane, Editor(s)

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