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Proceedings Paper

Fabrication of graphite masks for deep and ultradeep x-ray lithography
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Paper Abstract

Masks made from graphite stock material have been demonstrated as a cost-effective and reliable method of fabricating X-ray masks for deep and ultra-deep x-ray lithography (DXRL and UDXRL, respectively). The focus on this research effort was to fabricate masks that were compatible with the requirements for deep and ultra deep X-ray lithography by using UV optical lithography and gold electroforming. The major focus was on the uniform application of a thick resist on a porous graphite substrate. After patterning the resist, gold deposition was performed to build up the absorber structures using pulsed- electroplating. In this paper we will report on the current status of the mask fabrication process and present some preliminary exposure results.

Paper Details

Date Published: 11 August 2000
PDF: 9 pages
Proc. SPIE 4175, Materials and Device Characterization in Micromachining III, (11 August 2000); doi: 10.1117/12.395599
Show Author Affiliations
Yohannes M. Desta, Louisiana State Univ. (United States)
Georg Aigeldinger, Louisiana State Univ. (United States)
Kevin J. Zanca, Louisiana State Univ. (United States)
Philip J. Coane, Louisiana Tech Univ. (United States)
Jost Goettert, Louisiana State Univ. (United States)
Michael C. Murphy, Louisiana State Univ. (United States)

Published in SPIE Proceedings Vol. 4175:
Materials and Device Characterization in Micromachining III
Yuli Vladimirsky; Philip J. Coane, Editor(s)

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