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Proceedings Paper

Novel semiconductor/superlattice distributed Bragg reflector (DBR) grown by molecular beam epitaxy (MBE) and its characteristics
Author(s): Changling Yan; Jingchang Zhong; Yingjie Zhao; Ronghui Li
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Paper Abstract

A novel semiconductor/superlattice AlAs/[GaAs/AlAs] DBR has been obtained through replacing the AlxGa1-x$As in the AlAs/Al(subscript xGa1-xAs DBR with GaAs/AlAs superlattice. In experiment, a p-type of this kind of 19-period DBR has been grown by V80H MBE system. From the experimental reflection spectrum, the central wavelength of the DBP is about 850nm and the 19-period DBR has the reflectivity high up to as 99.5%. Moreover, by using twice self-designed tungsten filament mask and proton implantation method, the 10x10 (mu) m2square current flowing area has been made to measure the series resistance of the p-type DBR. The method can solve the difficulty in controlling the depth of etching prevent the occurrence of side etching in wet chemical etching usually used in experiments. From our experiment the series resistance of the DBR was just about 50 Ohms. Furthermore, the dependence of series resistance on temperature has also been studied. From the experimental results, it was found that the low series resistance of this kind of DBRs may be attributed to an increase in tunneling current on the semiconductor/superlattice minor structure that would leave to a decrease in the series resistance.

Paper Details

Date Published: 11 July 2000
PDF: 6 pages
Proc. SPIE 4078, Optoelectronic Materials and Devices II, (11 July 2000); doi: 10.1117/12.392120
Show Author Affiliations
Changling Yan, Changchun Institute of Optics and Fine Mechanics (China)
Jingchang Zhong, Changchun Institute of Optics and Fine Mechanics (China)
Yingjie Zhao, Changchun Institute of Optics and Fine Mechanics (China)
Ronghui Li, Changchun Institute of Optics and Fine Mechanics (China)

Published in SPIE Proceedings Vol. 4078:
Optoelectronic Materials and Devices II
Yan-Kuin Su; Pallab Bhattacharya, Editor(s)

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