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Proceedings Paper

Resolution enhancement techniques and mask manufacturability for subwavelength lithography
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Paper Abstract

This paper analyzes two resolution enhancement techniques: alternating PSM and sub-resolution assists from the point of view of their applicability to manufacturing of integrated circuits of 130 nm a d below.

Paper Details

Date Published: 19 July 2000
PDF: 7 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392103
Show Author Affiliations
Linard Karklin, Numerical Technologies, Inc. (United States)
Burn Jeng Lin, Linnovation, Inc. (Taiwan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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