Share Email Print
cover

Proceedings Paper

Pellicle degradation and its effect on surrounding environment in ArF lithography
Author(s): Junji Miyazaki; Takashi Okagawa; Keisuke Nakazawa; Toshiro Itani; Shigeto Shigematsu; Hiroaki Nakagawa
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

We investigated pellicle degradation during ArF laser irradiation and its effect on a substrate. The chemical structure of the pellicle film was not changed but its molecular weight decreased. F and C were observed on the substrate surface after irradiation. The source of the contamination was apparently film evaporation caused by ArF laser irradiation. Further experiments under conventional conditions, not accelerated conditions, will be necessary.

Paper Details

Date Published: 19 July 2000
PDF: 5 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392067
Show Author Affiliations
Junji Miyazaki, Semiconductor Leading Edge Technologies, Inc. (Japan)
Takashi Okagawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Keisuke Nakazawa, Semiconductor Leading Edge Technologies, Inc. (Japan)
Toshiro Itani, Semiconductor Leading Edge Technologies, Inc. (Japan)
Shigeto Shigematsu, Mitsui Chemicals, Inc. (Japan)
Hiroaki Nakagawa, Mitsui Chemicals, Inc. (Japan)


Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

© SPIE. Terms of Use
Back to Top