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Proceedings Paper

High-contrast i-line positive photoresist for laser reticle writer
Author(s): Yoshihito Kobayashi; Y. Oppata; Y. Ezoe; Fumiaki Shigemitsu; K. Urayama; K. Doi
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Paper Abstract

Lately laser writing tools have been dominated for producing leading-edge reticles. In addition, high resolution resist adjusted to the writing tool is strongly required to enhance the mask-making process capability. Here we have developed an i-line positive photoresist named 'THMR M100'. The most significant feature of the resists is higher contrast that can bring us high-resolution patterns as well as better CD accuracy. We realized 0.4 micron or less patterns were able to be formed with its high-contrast process in combination with ALTA tool. In fact the separate resolution was 0.3 micron. Furthermore, almost vertical side-wall angle of the developed resist was also achieved. We will deliver the excellent performance for fabricating the high-end reticles that this newly developed resist indicated.

Paper Details

Date Published: 19 July 2000
PDF: 6 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392066
Show Author Affiliations
Yoshihito Kobayashi, Toshiba Corp. (Japan)
Y. Oppata, Toshiba Corp. (Japan)
Y. Ezoe, Toshiba Corp. (Japan)
Fumiaki Shigemitsu, Toshiba Corp. (Japan)
K. Urayama, Toshiba Corp. (Japan)
K. Doi, Tokyo Ohka Kogyo Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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