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Proceedings Paper

CAR blanks feasibility study results
Author(s): Yasunori Yokoya; Hideo Kobayashi; Masahiro Hashimoto; Fumiko Ota; Keishi Asakawa
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Paper Abstract

The rise of a high acceleration voltage E-beam exposure tool has created a growing need for a chemically amplified resist system with high sensitivity, high contrast, superior resolution, superior PCD and PED stability. While mask- makers have been procuring resist coated blanks, it is generally considered that CARs must be spun on just prior to exposure due to its very short life after coating. However, it is general intention in the industry to stay in the same manner even with CARs for the next generation, which is the mission of blanks supplier also. In order to study feasibility for CARs coated blanks supply, we started screening CARs that were commercially available at present by patterning evaluation especially for PCD stability. We first tried to establish PSB and PEB optimization technique for CARs by using a benchmark resist of RE-5153P. We also tried to establish a stress tests for PCD stability by using NH3 gas and dry-N2 gas mixture. Then, we did comparative evaluation in patterning performance such as sensitivity, contrast, resolution, process latitude, PED and PCD stability among RE-5153P, EP-009, TLE-011, UVIIHS and others. ZEP7000 was also examined as another benchmark, which was the most popular resist at present for advanced EB reticle fabrication in the industry. This paper describes chemically amplified resist feasibility study result especially for blanks supply for the next generation e-beam reticle fabrication.

Paper Details

Date Published: 19 July 2000
PDF: 12 pages
Proc. SPIE 4066, Photomask and Next-Generation Lithography Mask Technology VII, (19 July 2000); doi: 10.1117/12.392064
Show Author Affiliations
Yasunori Yokoya, HOYA Corp. (Japan)
Hideo Kobayashi, HOYA Corp. (Japan)
Masahiro Hashimoto, HOYA Corp. (Japan)
Fumiko Ota, HOYA Corp. (Japan)
Keishi Asakawa, HOYA Corp. (Japan)

Published in SPIE Proceedings Vol. 4066:
Photomask and Next-Generation Lithography Mask Technology VII
Hiroaki Morimoto, Editor(s)

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