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Proceedings Paper

Novel interferometer to measure the figure of ashperical mirrors as used in EUV lithography
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Paper Abstract

A visible light interferometer to measure the figure of aspherical mirrors, as used in extreme-ultraviolet lithography, will be presented. Except for two fiber tips to generate the reference and object wavefronts, it contains no auxiliary optics. The phase difference is measured using frequency modulation and heterodyne techniques. The figure is computed from the phase difference. We determined the specifications for the two-dimensional detector array, with which the phase difference is measured, and computed the position accuracy of the optical components. The resolution of the frequency modulation system should be 0.3 micrometer and the accuracy of the heterodyne technique should be 0.1 nm.

Paper Details

Date Published: 21 July 2000
PDF: 10 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390119
Show Author Affiliations
Rene G. Klaver, Delft Univ. of Technology (Netherlands)
Joseph J. M. Braat, Delft Univ. of Technology (Netherlands)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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