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Proceedings Paper

Design of EUVL camera with large numerical aperture
Author(s): Yanqiu Li; Takeo Watanabe; Hiroo Kinoshita
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Paper Abstract

A design of four-mirror imaging optics is presented for the wavelength of 13.5 nm. The numerical aperture (NA) is 0.15. The reduction ratio is 5:1. The exposure area on wafer is 0.5 mm (width) X 25 mm (chord length). The designed resolution is 50 nm with MTF approximately equals 60%. The distortion is less than 0.01% and the astigmatism is near zero at the designed ring field.

Paper Details

Date Published: 21 July 2000
PDF: 6 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390115
Show Author Affiliations
Yanqiu Li, Himeji Institute of Technology (Japan)
Takeo Watanabe, Himeji Institute of Technology (Japan)
Hiroo Kinoshita, Himeji Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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