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Proceedings Paper

Vacuum spark for soft x-rays and the spherical pinch for EUV as point sources for microlithography
Author(s): Frank F. Wu; Wen-Chieh Tang; Kazimierz W. Wirpszo; Xiaoming Guo; Meisheng Xu; Oleg G. Semyonov; C. Huang; Lev Klibanov; Emilio Panarella
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Paper Abstract

The VSX is essentially a miniature discharge capable of emitting soft X-ray radiation. Because the radiation is emitted in small dose in each spark, it is necessary to repeat the phenomenon at high frequency in order to achieve the industrial throughput requirement. Relying on a X-ray collimator (either nested cones or capillary), the point radiation source can deliver a high quality beam suitable for microlithography. Current study shows that the X-ray energy per pulse can be 113 (mu) J or higher with a pulse width (FWHM) of less than 50 ns. A 30 kHz operation in burst mode has been realized. The optimum conditions of the VSX operation have been carefully studied and are reported here. The lifetime can be as high as tens of hours in the low frequency operation or 100 million shots and this figure can be greatly improved. Pinhole camera images show that the source size is less than 1 mm. The throughput of exposing 1 field per hour or more is readily achievable with current parameters and can be greatly improved with the higher operating frequency. The Spherical Pinch is a modified (theta) -pinch with high efficiency in the EUV region of spectrum. Working with different gases, the SPX machine (up to 33 kJ input energy) is optimized for EUV emission and can be fitted in an advanced EUV lithography system. The point source requirements are indeed met by the SPX for such system.

Paper Details

Date Published: 21 July 2000
PDF: 11 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390113
Show Author Affiliations
Frank F. Wu, ALFT, Inc. (United States)
Wen-Chieh Tang, ALFT, Inc. (Canada)
Kazimierz W. Wirpszo, ALFT, Inc. (Canada)
Xiaoming Guo, ALFT, Inc. (Canada)
Meisheng Xu, ALFT, Inc. (Canada)
Oleg G. Semyonov, ALFT, Inc. (United States)
C. Huang, ALFT, Inc. (Canada)
Lev Klibanov, ALFT, Inc. (Israel)
Emilio Panarella, ALFT, Inc. (Canada)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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