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Proceedings Paper

Processing latitude study on x-ray phase-shifting masks
Author(s): Lei Yang; Mumit Khan; James Welch Taylor; Yuli Vladimirsky; Niru V. Dandekar
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Paper Abstract

Phase-shifting masks have been applied in optical lithography and various phase-shifting techniques in X-ray Lithography (XRL) have been demonstrated. In this study, we compare different phase-shifting technologies for XRL, such as clear phase mask, attenuated phase-shifting mask and alternating aperture phase-shifting mask through computer simulation. The control of critical dimension is of primary importance as the CD shrinks to the sub-100 nm region. We have reported our design and fabrication of a more robust X-ray Phase Mask, which is capable of sub-70 nm imaging. The processing latitude of this design is investigated in terms of the X-ray source broadening, phase-shifter uniformity, mask-to-wafer gap and sidewall slope of the phase-shifter. The latitude is compared with those results from an attenuated phase shifting mask and an alternating aperture phase shifting mask.

Paper Details

Date Published: 21 July 2000
PDF: 9 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390092
Show Author Affiliations
Lei Yang, Univ. of Wisconsin/Madison (United States)
Mumit Khan, Univ. of Wisconsin/Madison (United States)
James Welch Taylor, Univ. of Wisconsin/Madison (United States)
Yuli Vladimirsky, JMAR Reseach, Inc. (United States)
Niru V. Dandekar, Sanders, A Lockheed Martin Co. (United States)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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