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Proceedings Paper

Recent advances of three-aspherical-mirror system for EUVL
Author(s): Hiroo Kinoshita; Takeo Watanabe; Yanqiu Li; Atsushi Miyafuji; Tetsuya Oshino; Katsumi Sugisaki; Katsuhiko Murakami; Shigeo Irie; Shigeru Shirayone; Shinji Okazaki
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Paper Abstract

A three-aspherical-mirror system for Extreme Ultraviolet Lithography has been developed. The aspherical mirrors were fabricated using the computer controlled optical surfacing (CCOS) process and a phase shift interferometer. The mirrors have a figure error of 0.58 nm and surface roughness of 0.3 nm. In order to obtain a high efficiency mirror, M1 and M2 were coated with a graded d-spacing Mo/Si multilayer and mirror M3 was coated with a uniform d-spacing Mo/Si multilayer. The peak reflectivity is 65% at the wavelength of 13.5 nm. The wavelength matching of each mirror spans 0.45 nm. The mirrors were aligned with a Fizeau-type phase shift interferometer, and a final wavefront error of less than 3 nm was achieved. Exposure experiments carried out at new Subaru synchrotron facility revealed that this system is capable of replicating a 56 nm pattern in a 10 mm X 1 mm exposure field.

Paper Details

Date Published: 21 July 2000
PDF: 6 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390091
Show Author Affiliations
Hiroo Kinoshita, Himeji Institute of Technology (Japan)
Takeo Watanabe, Himeji Institute of Technology (Japan)
Yanqiu Li, Himeji Institute of Technology (Japan)
Atsushi Miyafuji, Himeji Institute of Technology (Japan)
Tetsuya Oshino, Nikon Corp. (Japan)
Katsumi Sugisaki, Nikon Corp. (Japan)
Katsuhiko Murakami, Nikon Corp. (Japan)
Shigeo Irie, Association of Super-Advanced Electronics Technologies (Japan)
Shigeru Shirayone, Association of Super-Advanced Electronics Technologies (Japan)
Shinji Okazaki, Association of Super-Advanced Electronics Technologies (Japan)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

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