Share Email Print

Proceedings Paper

Overview and status of the Next Generation Lithography Mask Center of Competency
Author(s): Lucien Bouchard
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Next Generation Lithography (NGL) technologies require masks that are significantly different from each other and from conventional photomasks but possess many similarities and processing challenges. The Next Generation Lithography Mask Center of Competency (NGL-MCOC) was formed to identify these process issues and potential areas for commonality and eventually provide a commercialization path for NGL masks. The NGL-MCOC consists of a partnership between Photronics and IBM. The IBM advanced mask facility is applying the technology developed for x-ray masks to other NGL technologies, and Photronics is supplying the organization and eventual commercialization of the technology. To broadly address NGL mask issues, the NGL-MCOC has collaborated with the NGL industry champions. Mask blanks have been written for SCALPEL./eLith, EUV-LLC, and Infineon/IPL. By utilizing common patterns and as much common processing as possible, rapid process development and efficient comparison of the mask issues with the different NGL technologies is quickly achieved. In addition, the NGL-MCOC has fabricated mask blanks for SCALPEL and stencil to evaluate new materials and process options.

Paper Details

Date Published: 21 July 2000
PDF: 9 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390052
Show Author Affiliations
Lucien Bouchard, IBM Microelectronics Div. (United States)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?