Share Email Print

Proceedings Paper

EUV interferometry of a four-mirror ring-field EUV optical system
Author(s): Kenneth A. Goldberg; Patrick P. Naulleau; Phillip J. Batson; Paul Denham; Erik H. Anderson; Jeffrey Bokor; Henry N. Chapman
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

At-wavelength, extreme ultraviolet interferometric measurements of a new, four-mirror, ring-field projection optical system have been made. Designed for operation at 13.4- nm wavelength with a 0.1 numerical aperture and a 26 mm field of view at the wafer, the nearly diffraction-limited wavefront quality of the system has been verified interferometrically. After assembly and alignment with visible-light interferometry, the optic was transported to Lawrence Berkeley National Laboratory where the at-wavelength testing with a phase-shifting point diffraction interferometer was performed. Measurement of the system wavefront at a number of points across the field of view reveals the optical performance of the system over its large, ring-field imaging area.

Paper Details

Date Published: 21 July 2000
PDF: 7 pages
Proc. SPIE 3997, Emerging Lithographic Technologies IV, (21 July 2000); doi: 10.1117/12.390045
Show Author Affiliations
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)
Phillip J. Batson, Lawrence Berkeley National Lab. (United States)
Paul Denham, Lawrence Berkeley National Lab. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
Jeffrey Bokor, Lawrence Berkeley National Lab. and Univ. of California/Berkeley (United States)
Henry N. Chapman, Lawrence Livermore National Lab. (United States)

Published in SPIE Proceedings Vol. 3997:
Emerging Lithographic Technologies IV
Elizabeth A. Dobisz, Editor(s)

© SPIE. Terms of Use
Back to Top