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Proceedings Paper

Continuous Image Writer: a new approach to fast direct writing
Author(s): Joerg Paufler; Stefan Brunn; Joachim Bolle; Tim Koerner; Aenne Baudach; Reiner Lindner
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Paper Abstract

We report on the development of a production tool of a new system for fast submicron lithography by optical direct wring. The Continuous Image Writer (CIW) combines the advantages of direct writing by using a programmable mask with the advantages of conventional optical lithography by using the same lithographic processes for image formation in photoresists. The CIW can write faster than conventional direct writers and it is more flexible than wafer steppers or scanners. The CIW is designed for maskless patterning of wafers and substrates down to 0.60 micrometers feature size. It reaches a maximum writing speed of 1,250 mm2/min. Our system uses a Lambda Physik KrF excimer laser as light source. The CIW includes all the components necessary for the fully automated exposure of wafers or substrates including automated substrate handling and alignment.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389081
Show Author Affiliations
Joerg Paufler, SENTECH Instruments GmbH (Germany)
Stefan Brunn, SENTECH Instruments GmbH (Germany)
Joachim Bolle, SENTECH Instruments GmbH (Germany)
Tim Koerner, SENTECH Instruments GmbH (Germany)
Aenne Baudach, SENTECH Instruments GmbH (Germany)
Reiner Lindner, Lambda Physik GmbH (Germany)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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