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Proceedings Paper

Effect of nonlinear errors on 300-mm wafer overlay performance
Author(s): Sebastian Schmidt; Alain B. Charles; Dietmar Ganz; Steffen R. Hornig; Guenther Hraschan; John G. Maltabes; Karl E. Mautz; Thomas Metzdorf; Ralf Otto; Jochen Scheurich; Thorsten Schedel; Ralf Schuster
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Paper Abstract

SEMICONDUCTOR3000 was the first pilot production facility for 300nm wafers in the world. This company, a joint venture between Infineon Technologies and Motorola, is working to develop a manufacturable 300mm wafer tool set. The lithography tools include I-line stepper, and two DUV scanners. These tools are used to build both 64M DRAM devices and aggressive test vehicles. This paper shows the influence of non-linear errors on 300nm wafers is much stronger than on 200mm wafers. The team determined the root causes for the stronger appearance of these effects and proposed solutions to improve the overlay performance.

Paper Details

Date Published: 5 July 2000
PDF: 9 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389080
Show Author Affiliations
Sebastian Schmidt, Semiconductor300 GmbH (Germany)
Alain B. Charles, Semiconductor300 GmbH (Germany)
Dietmar Ganz, Semiconductor300 GmbH (Germany)
Steffen R. Hornig, Semiconductor300 GmbH (Germany)
Guenther Hraschan, Semiconductor300 GmbH (Germany)
John G. Maltabes, Semiconductor300 GmbH (Germany)
Karl E. Mautz, Semiconductor300 GmbH (Germany)
Thomas Metzdorf, Semiconductor300 GmbH (Germany)
Ralf Otto, Semiconductor300 GmbH (Germany)
Jochen Scheurich, Semiconductor300 GmbH (Germany)
Thorsten Schedel, Semiconductor300 GmbH (Germany)
Ralf Schuster, Semiconductor300 GmbH (Germany)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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