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Proceedings Paper

Self-sustaining dose control system: ways to improve the exposure process
Author(s): Gregory J. Kivenzor
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Paper Abstract

In the semiconductor equipment business, self-metrology calls for in-situ measurements and diagnostics of the process parameters. For exposure tools, self-diagnostics and self-tuning are the core features. The present paper discusses a dose control system that allows for monitoring, correction and periodic self-calibration of the litho tool. Creation of such a system becomes a task even more complex in view of the aggressive illumination environment - 193 and 157 nm - that makes most traditional optical materials inapplicable; and causes many that are applicable to have time-varying performance.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389077
Show Author Affiliations
Gregory J. Kivenzor, SVG Lithography Systems, Inc. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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