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Proceedings Paper

Implementation of an automated feedback focus control methodology for Nikon (NSR) i-line and DUV steppers and scanners
Author(s): Ivan Lalovic; Joseph T. Parry; Brett Gwynn; Christopher D. Silsby
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Paper Abstract

Accurate and precise metrology and control for stepper or scanner objective lens focal-length is critical for sub- 0.25micrometers design-rule photolithography, specifically for CD, isolated-dense offset, and resist sidewall control of minimum feature geometries. As next generation processes result in reduction of the manufacturing process latitudes, contribution of the focus metrology error will continue to consume a larger portion of the useable depth of focus. In addition to improvement of the cross-field photoresists image fidelity, if the focal length measurement precision is improved, lithographic rework and device yield implications, due to mask and imaging linewidth error, are minimized in production.

Paper Details

Date Published: 5 July 2000
PDF: 10 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389073
Show Author Affiliations
Ivan Lalovic, Hewlett-Packard Co. (United States)
Joseph T. Parry, Nikon Precision Inc. (United States)
Brett Gwynn, Nikon Precision Inc. (United States)
Christopher D. Silsby, Hewlett-Packard Co. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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