Proceedings Paper
Linewidth uniformity error analysis for step-and-scan systems| Format | Member Price | Non-Member Price |
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Paper Abstract
The analysis proposed attempts to identify the systematic and non-systematic errors in linewidth uniformity data and their magnitudes. Specific to step-and-scan systems are various error components to linewidth such as optical slot errors, stage scan errors and wafer residual errors. We explore ways of handling these errors and applying developed methods to actual micrascan data in order to understand how to improve linewidth control.
Paper Details
Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389071
Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389071
Show Author Affiliations
John D. Zimmerman, SVG Lithography Systems, Inc. (United States)
Javed Sumra, SVG Lithography Systems, Inc. (United States)
Y.K. Arif Leong, SVG Lithography Systems, Inc. (United States)
Javed Sumra, SVG Lithography Systems, Inc. (United States)
Y.K. Arif Leong, SVG Lithography Systems, Inc. (United States)
Pradeep K. Govil, SVG Lithography Systems, Inc. (United States)
Greg H. Baxter, SVG Lithography Systems, Inc. (United States)
Greg H. Baxter, SVG Lithography Systems, Inc. (United States)
Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)
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