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Proceedings Paper

Application of an effective wavelet matrix transform approach for optical lithography simulation: analysis of topological effects of phase-shifting masks
Author(s): Seung-Gol Lee; Hyun-Jun Kim; Dong-Hoon Lee; Jong-Ung Lee
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Paper Abstract

In this paper, the boundary element method (BEM) is newly applied to the numerical simulation of an optical lithography, and also is combined with the wavelet matrix transform approach in order to resolve the disadvantage of BEM. Though the impedance matrix derived from the boundary element formulation is usually unsymmetric and fully populated with non-zero elements, the combination of two methods transforms it into the highly sparse matrix, which can be solved efficiently by a sparse solver. The prosed method is implemented for analyzing the topological effect of 2D phase-shifting masks, and their result are compared with those of the waveguide method. From the comparison, it is confirmed that the proposed method would be more efficient than the methods based on either BEM itself or the waveguide method in views of the convergence, the accuracy, the calculation time and the usage of computer memory.

Paper Details

Date Published: 5 July 2000
PDF: 11 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389065
Show Author Affiliations
Seung-Gol Lee, Inha Univ. (South Korea)
Hyun-Jun Kim, Inha Univ. (South Korea)
Dong-Hoon Lee, Inha Univ. (South Korea)
Jong-Ung Lee, Chongju Univ. (South Korea)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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