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Proceedings Paper

Realization of very small aberration projection lenses
Author(s): Toshiyuki Yoshihara; Ryo Koizumi; Kazuhiro Takahashi; Shigeyuki Suda; Akiyoshi Suzuki
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Paper Abstract

To implement low-k1 lithography, it is most fundamental to reduce aberrations of projection lenses for the exposure tools, not only in the optical design, but also in the manufacturing process. This paper will reveal a new lens manufacturing concept utilizing Zernike circle polynomials to overcome such difficulties. Sets of Zernike coefficients are used to describe the surface accuracy of each element or wavefront aberrations of assembled lens, and each coefficient itself becomes the target of element polishing or lens tuning. Adopting these targets is the most effective way to control actual optical performance and result in a great improvement of the projection lenses. We present some topics of our new manufacturing process and the performance progress up to our latest KeF stepper, FPA-3000EX6.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389045
Show Author Affiliations
Toshiyuki Yoshihara, Canon Inc. (Japan)
Ryo Koizumi, Canon Inc. (Japan)
Kazuhiro Takahashi, Canon Inc. (Japan)
Shigeyuki Suda, Canon Inc. (Japan)
Akiyoshi Suzuki, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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