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Proceedings Paper

193-nm step-and-scan lithography equipment
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Paper Abstract

As the 130 nm era is approaching, requirements for lithography are becoming more and more rigorous. We have developed a 193nm scanner for below 130nm geometries capable of handling either 200 mm or 300 mm wafers. This paper describes the lithography tool performance required for printing 130nm features, focusing on a new 193nm excimer laser exposure tool developed for that age.

Paper Details

Date Published: 5 July 2000
PDF: 10 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389041
Show Author Affiliations
Naoto Sano, Canon Inc. (Japan)
Kazuhiro Takahashi, Canon Inc. (Japan)
Hitoshi Nakano, Canon Inc. (Japan)
Akiyoshi Suzuki, Canon Inc. (Japan)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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