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Proceedings Paper

Prospects for long-pulse operation of ArF lasers for 193-nm microlithography
Author(s): Thomas Hofmann; Bruce Johanson; Palash P. Das
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Paper Abstract

The phenomenon of compaction of fused silica is a major concern in 193nm lithography. Numerous studies have shown that as a result, the cost-of-operation of 193nm lithography is expected to be significantly higher than at 248nm due to the degradation of scanner optics. Recent studies have also shown that compact could be reduced by increasing the pulse length of the ArF laser since the magnitude of compaction reduced as 1/(Tis)0.6. Here, Tis is the integral square pulse duration and is given.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389039
Show Author Affiliations
Thomas Hofmann, Cymer, Inc. (United States)
Bruce Johanson, Cymer, Inc. (United States)
Palash P. Das, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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