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Proceedings Paper

Spatial frequency filtering in the pellicle plane
Author(s): Bruce W. Smith; Hoyoung Kang
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Paper Abstract

An approach to spatial frequency filtering is described where 'zero order' mask diffraction information is reduced, enhancing imaging performance. This method of resolution enhancement is accomplished by filtering in an alternative pupil plane of the objective lens, specifically near or beyond the mask pellicle plane. By introducing an angular specific transmission filter into the Fraunhofer diffraction field of the mask, user accessibility is introduced, allowing for a practical approach to frequency filtering. This is accomplished using a specifically designed interference filter coated over a transparent substrate. Analysis of the approach is given along with result from experiments for contact features using a full field high NA 148nm exposure tool.

Paper Details

Date Published: 5 July 2000
PDF: 14 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389014
Show Author Affiliations
Bruce W. Smith, Rochester Institute of Technology (United States)
Hoyoung Kang, Rochester Institute of Technology (United States)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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