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Proceedings Paper

Half-lambda imaging with KrF: performance challenges and trade-offs as expected through simulation
Author(s): Steve D. Slonaker
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Paper Abstract

As interferometry becomes readily and regularly available from the lithography projection lens testing process, the question to lithographers becomes, what can it tell us. The absence of a reliable and robust resist simulation treatment for chemically amplified resists leaves us searching for other ways to utilize the lens test interferometry data to help learn about the failure mechanisms associated with KrF imaging. Various simulation exercises and methods will be explored in the resolution regime near half-lambda, with the goal of identifying metrics which can be used to highlight imaging response optima as well as failure tendencies.

Paper Details

Date Published: 5 July 2000
PDF: 12 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.389000
Show Author Affiliations
Steve D. Slonaker, Nikon Precision Inc. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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