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Proceedings Paper

New silica glass (AQF) for 157-nm lithography
Author(s): Yoshiaki Ikuta; Shinya Kikugawa; T. Kawahara; H. Mishiro; Noriaki Shimodaira; Shuhei Yoshizawa
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Paper Abstract

Projection photolithography at 157 nm is now under research as a possible extension of current 248 nm and planned 193 nm technologies. We have succeeded in the development of the modified fused silica glass 'AQF' for 157 nm lithography. In this paper, we present the performance of the newest material; AQF/Ver. 2.1. Transmission and its uniformity at 157 nm is better than 78 +/- 1.5 percent, and birefringence is within 2nm. The surface flatness is less than 0.5 micrometers , and surface defects over 0.4 micrometers in size are free.

Paper Details

Date Published: 5 July 2000
PDF: 5 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388990
Show Author Affiliations
Yoshiaki Ikuta, Asahi Glass Co., Ltd. (Japan)
Shinya Kikugawa, Asahi Glass Co., Ltd. (Japan)
T. Kawahara, Asahi Glass Co., Ltd. (Japan)
H. Mishiro, Asahi Glass Co., Ltd. (Japan)
Noriaki Shimodaira, Asahi Glass Co., Ltd. (Japan)
Shuhei Yoshizawa, Asahi Glass Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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