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Proceedings Paper

Comparison of ArF and KrF laser performance at 2 kHz for microlithography
Author(s): Herve Besaucele; Palash P. Das; Thomas P. Duffey; Todd J. Embree; Alexander I. Ershov; Vladimir B. Fleurov; Steven L. Grove; Paul C. Melcher; Richard M. Ness; Gunasiri G. Padmabandu
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Paper Abstract

Exposure tools for 193nm lithography are expected to use Argon-Fluoride lasers at repetition rates of at least 2kHz. We are showing that, by revisiting several key technologies, the performance and reliability of ArF lasers at 2 kHz are trending towards a level comparable to KrF lasers.

Paper Details

Date Published: 5 July 2000
PDF: 5 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388986
Show Author Affiliations
Herve Besaucele, Cymer, Inc. (United States)
Palash P. Das, Cymer, Inc. (United States)
Thomas P. Duffey, Cymer, Inc. (United States)
Todd J. Embree, Cymer, Inc. (United States)
Alexander I. Ershov, Cymer, Inc. (United States)
Vladimir B. Fleurov, Cymer, Inc. (United States)
Steven L. Grove, Cymer, Inc. (United States)
Paul C. Melcher, Cymer, Inc. (United States)
Richard M. Ness, Cymer, Inc. (United States)
Gunasiri G. Padmabandu, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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