Share Email Print

Proceedings Paper

Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography
Author(s): Rainer Paetzel; Hans Stephen Albrecht; Vadim Berger; Igor Bragin; Matthias Kramer; Juergen Kleinschmidt; Marcus Serwazi
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

We have developed a KrF excimer laser with ultra narrow linewidth and high repetition rate applicable for optical lithography using DUV wafer scanners with highest numerical aperture (NA) of more than 0.8. A laser bandwidth of less than 0.4 pm, full width half maximum, is achieved by our new design of the laser resonator, which is based on out patented polarization coupled resonator. The new resonator design increase the efficiency of ht laser optics and improves the wavelength stability. The laser tube and solid sate pulser have been adapted to the new laser resonator. As a result, another step in the reduction of the cost of operation is achieved. The laser operates with a repetition rate of 2 kHz and gives a large operation range with respect to wavelength and energy range. The characteristic performance of this new excimer laser is presented.

Paper Details

Date Published: 5 July 2000
PDF: 5 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388985
Show Author Affiliations
Rainer Paetzel, Lambda Physik GmbH (Germany)
Hans Stephen Albrecht, Lambda Physik GmbH (Germany)
Vadim Berger, Lambda Physik GmbH (Germany)
Igor Bragin, Lambda Physik GmbH (Germany)
Matthias Kramer, Lambda Physik GmbH (Germany)
Juergen Kleinschmidt, Lambda Physik GmbH (Germany)
Marcus Serwazi, Lambda Physik GmbH (Germany)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

© SPIE. Terms of Use
Back to Top