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Proceedings Paper

Output stabilization technology with chemical impurity control on ArF excimer laser
Author(s): Akira Sumitani; Satoshi Andou; Takehito Watanabe; Masayuki Konishi; Suguru Egawa; Ikuo Uchino; Takeshi Ohta; Katsutomo Terashima; Natsushi Suzuki; Tatsuo Enami; Hakaru Mizoguchi
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Paper Abstract

Based on accurate gas analysis technology it has been found that both gas purity and gas control are key factors in optimizing the performance of ArF excimer lasers. The study of the behavior of gas impurities inside the laser chamber showed that impurities built up not only during laser operation but also during rest periods. In-situ gas analysis and controlled impurity gas addition clarified that hydrogen fluoride and oxygen impurities, are the main causes for the decrease of laser output energy. Based on our experiments, a modified gas composition was chosen for the ArF laser that significantly improved its output characteristics.

Paper Details

Date Published: 5 July 2000
PDF: 11 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000);
Show Author Affiliations
Akira Sumitani, Komatsu Ltd. (Japan)
Satoshi Andou, Komatsu Ltd. (Japan)
Takehito Watanabe, Komatsu Ltd. (Japan)
Masayuki Konishi, Komatsu Ltd. (Japan)
Suguru Egawa, Komatsu Ltd. (Japan)
Ikuo Uchino, Komatsu Ltd. (Japan)
Takeshi Ohta, Komatsu Ltd. (Japan)
Katsutomo Terashima, Komatsu Ltd. (Japan)
Natsushi Suzuki, Komatsu Ltd. (Japan)
Tatsuo Enami, Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Komatsu Ltd. (Japan)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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