Proceedings Paper
Performance of very high repetition rate ArF lasers| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
We report the performance of a very high repetition rate ArF laser optimized for next generation, high NA, high throughput scanner. The laser's repetition rate exceeds 4kHz, at 5mJ, and at bandwidths of less than 1.2 pm. We discuss the complexity of high power operation, and make some estimates about the robustness of this technology. In particular, we discuss the risks of scaling to this high repetition rate, and prospects of exceeding 4kHz to near 6kHz with 95 percent bandwidths of less than 1pm.
Paper Details
Date Published: 5 July 2000
PDF: 6 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388979
Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)
PDF: 6 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388979
Show Author Affiliations
Jean-Marc Hueber, Cymer, Inc. (United States)
Herve Besaucele, Cymer, Inc. (United States)
Palash P. Das, Cymer, Inc. (United States)
Rick Eis, Cymer, Inc. (United States)
Alexander I. Ershov, Cymer, Inc. (United States)
Vladimir B. Fleurov, Cymer, Inc. (United States)
Dmitri Gaidarenko, Cymer, Inc. (United States)
Herve Besaucele, Cymer, Inc. (United States)
Palash P. Das, Cymer, Inc. (United States)
Rick Eis, Cymer, Inc. (United States)
Alexander I. Ershov, Cymer, Inc. (United States)
Vladimir B. Fleurov, Cymer, Inc. (United States)
Dmitri Gaidarenko, Cymer, Inc. (United States)
Thomas Hofmann, Cymer, Inc. (United States)
Paul C. Melcher, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
Bernard K. Nikolaus, Cymer, Inc. (United States)
Scot Smith, Cymer, Inc. (United States)
Kyle Webb, Cymer, Inc. (United States)
Paul C. Melcher, Cymer, Inc. (United States)
William N. Partlo, Cymer, Inc. (United States)
Bernard K. Nikolaus, Cymer, Inc. (United States)
Scot Smith, Cymer, Inc. (United States)
Kyle Webb, Cymer, Inc. (United States)
Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)
© SPIE. Terms of Use
