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Proceedings Paper

High-repetition-rate ultranarrow-bandwidth 193-nm excimer lasers for DUV lithography
Author(s): Uwe Stamm; Rainer Paetzel; Igor Bragin; Juergen Kleinschmidt; Peter Lokai; Rustem Osmanov; Thomas Schroeder; Martin Sprenger; Wolfgang Zschocke
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Paper Abstract

Results on the feasibility of highest repetition rate ArF lithography excimer lasers with narrow spectral bandwidth of less than 0.4 pm are presented. The current 193 nm lithography laser product NovaLine A2010 delivers output power of 10W at 2 kHz repetition rate with energy dose stability of +/- 0.5 percent. A novel 193 nm absolute wavelength calibration technique has ben incorporated in the laser which gives absolute wavelength accuracy better than 0.5 pm. Long-term results of optical materials, coatings and laser components give insight into estimated cost of ownership developments for the laser operation over the next years. Progress in pulse stretching approaches to achieve lower stress of the wafer scanner illumination optics and lens allow optimistic estimates of total system CoO. Initial results on the laser operation at 4 kHz in order to reach 20W output power are discussed.

Paper Details

Date Published: 5 July 2000
PDF: 7 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388976
Show Author Affiliations
Uwe Stamm, Lambda Physik GmbH (Germany)
Rainer Paetzel, Lambda Physik GmbH (Germany)
Igor Bragin, Lambda Physik GmbH (Germany)
Juergen Kleinschmidt, Lambda Physik GmbH (Germany)
Peter Lokai, Lambda Physik GmbH (Germany)
Rustem Osmanov, Lambda Physik GmbH (Germany)
Thomas Schroeder, Lambda Physik GmbH (Germany)
Martin Sprenger, Lambda Physik GmbH (Germany)
Wolfgang Zschocke, Lambda Physik GmbH (Germany)


Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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