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Proceedings Paper

OPC beyond 0.18 mm: OPC on PSM gates
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Paper Abstract

For lithography smaller that 180 nm using 248 nm steppers, phase-shifting lithography is becoming more routine. However, when applied to very small dimensions, OPC effects begin to become pronounced. We have design a new phase- shifting test structure for reticles to address these phase shifting distortions, and report on its use.

Paper Details

Date Published: 5 July 2000
PDF: 8 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388942
Show Author Affiliations
Franklin M. Schellenberg, Mentor Graphics Corp. (United States)
Olivier Toublan, Mentor Graphics Corp. (United States)
Nicolas B. Cobb, Mentor Graphics Corp. (United States)
Emile Y. Sahouria, Mentor Graphics Corp. (United States)
Greg P. Hughes, Reticle Technology Ctr. (United States)
Susan S. MacDonald, DuPont Photomask (United States)
Craig A. West, DuPont Photomask (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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