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Proceedings Paper

Review of photoresist-based lens evaluation methods
Author(s): Joseph P. Kirk
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Paper Abstract

Optical lithography is moving into an era of refinement where lenses are continuously improving but must be superb to utilize the resolution enabled by new complex reticles. Phase Measuring Interferometry used during lens fabrication is not available to the lithographer who must rely on ingenuity in reticle design to form measurable, aberration sensitive images in photoresist. This ingenuity, as reported in the papers that follow, is enabling lithographers to measure lens aberrations on their tools with a precision nearly that of a PMI. The principles behind these photoresist methods are reviewed in this paper to help enable critical review of those that follow.

Paper Details

Date Published: 5 July 2000
PDF: 7 pages
Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); doi: 10.1117/12.388926
Show Author Affiliations
Joseph P. Kirk, IBM Microelectronics Div. (United States)

Published in SPIE Proceedings Vol. 4000:
Optical Microlithography XIII
Christopher J. Progler, Editor(s)

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