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Proceedings Paper

High-performance 193-nm positive resist using alternating polymer system of functionalized cyclic olefins/maleic anhydride
Author(s): Katsuji Douki; Toru Kajita; Tsutomu Shimokawa
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Paper Abstract

Tetracyclododecene (TCD) was employed as a key alicyclic structure because TCD-based resist system with high carbon content would show better lithographic performance and better etch resistance than norbornene-based ones. Since hydrophilicity is inherently required in the TCD-based system for good developability, several TCDs functionalized with hydroxyl group were synthesized by Diels-Alder reaction. Calculation by the group contribution methods was carried out in order to estimate the hydrophilicity of the TCDs. Several functionalized TCD-alt-maleic anhydride (MAH) alternating polymers were prepared by free radical polymerization and the alkaline solubility of those polymers were determined using DRM. An optimized resist showed good lithographic performances when a conventional illumination (0.63 NA, (sigma) equals 0.65) is used with a binary mask. The resist could print 110 nm and 100 nm lines on SiON with good proximity bias and large focus latitude. The resist also exhibited better etch resistance than norbornene-based resist system under various etch conditions.

Paper Details

Date Published: 23 June 2000
PDF: 8 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388277
Show Author Affiliations
Katsuji Douki, JSR Corp. (United States)
Toru Kajita, JSR Corp. (Japan)
Tsutomu Shimokawa, JSR Corp. (Japan)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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