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Proceedings Paper

Design and lithographic performances of 193-specific photoacid generators
Author(s): Hiroyuki Ishii; Shinji Usui; Katsuji Douki; Toru Kajita; Hitoshi Chawanya; Tsutomu Shimokawa
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Paper Abstract

The improvement of the transparency of photoacid generators (PAGs) has an researchers' attention for 193-resist application. In this study, sulfonium salt was chosen as a target PAG. Triphenyl sulfonium salt (TPS) showing strong absorption at 193 nm was selected as a standard PAG. Starting from the ordinary compound, designing several 193-specific PAGs was attempted. Molecular orbital (MO) calculation was used for the estimation of transparency of PAGs. The calculated absorption results fit in with observed absorption spectra of synthesized PAGs in poly(methyl methacrylate) matrix. Furthermore, MO calculation illustrated that polycyclic aromatic systems based on (pi) -system extension concept should be preferable in terms of transparency at 193 nm. A new PAG was synthesized based on the (pi) -extended concept. The resist comprising the new PAG was evaluated in order to verify the effect of transparency improvement. The resist provide good lithographic performances, vertical wall angle without deterioration of photospeed, The MO calculations have materialized a 193-specific PAG for further improvement of resist performances.

Paper Details

Date Published: 23 June 2000
PDF: 8 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388276
Show Author Affiliations
Hiroyuki Ishii, JSR Corp. (Japan)
Shinji Usui, JSR Corp. (Japan)
Katsuji Douki, JSR Corp. (United States)
Toru Kajita, JSR Corp. (Japan)
Hitoshi Chawanya, JSR Corp. (Japan)
Tsutomu Shimokawa, JSR Corp. (Japan)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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