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Proceedings Paper

Second-generation 193-nm bottom antireflective coatings (BARCs)
Author(s): James D. Meador; Xie Shao; Vandana N. Krishnamurthy; Mikko Arjona; Mandar Bhave; Gu Xu; James B. Claypool; Anne Lindgren
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Paper Abstract

Two organic, spin-on BARCs are in the small scale manufacturing phase -- with the goal being a 193-nm product optimized for commercialization. Chemistries of the BARCs are shown in this paper and performance of the two products relative to industry accepted needs is discussed. The thermoset BARCs, EXP98090B and EXP99001D, are prepared from hydroxy-functional, dye-attached acrylic polymers by adding an aminoplast and sulfonic acid catalyst. With select 193-nm resists, the BARCs give resolution of L/S pairs down to 0.12 micrometer. Plasma etch rates of both BARCs are comparable to those of 193-nm photoresists. Other BARC performance parameters that are discussed for the two products include: film and optical properties, conformality, simulated reflectance curves, spin-bowl compatibility, metals content, and defects.

Paper Details

Date Published: 23 June 2000
PDF: 10 pages
Proc. SPIE 3999, Advances in Resist Technology and Processing XVII, (23 June 2000); doi: 10.1117/12.388264
Show Author Affiliations
James D. Meador, Brewer Science, Inc. (United States)
Xie Shao, Brewer Science, Inc. (United States)
Vandana N. Krishnamurthy, Brewer Science, Inc. (United States)
Mikko Arjona, Brewer Science, Inc. (United States)
Mandar Bhave, Brewer Science, Inc. (United States)
Gu Xu, Brewer Science, Inc. (United States)
James B. Claypool, Brewer Science, Inc. (United States)
Anne Lindgren, Brewer Science, Inc. (United States)

Published in SPIE Proceedings Vol. 3999:
Advances in Resist Technology and Processing XVII
Francis M. Houlihan, Editor(s)

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