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Proceedings Paper

Capacitive discharge excilamps
Author(s): Edward A. Sosnin; Mikhail V. Erofeev; Alexei N. Panchenko; Mikhail I. Lomaev; Victor S. Skakun; Dmitrii V. Shitz; Victor F. Tarasenko
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Paper Abstract

Investigation was made ofthe characteristics ofXeCl (λ ~ 308 nm), KrC1 (λ ~ 222 nm) and Xci (λ ~ 253 nm) capacitive discharge excilamps. High efficiency of exciplex molecules and simple design have been obtained under capacitive HF discharge excitation. Cylindrical excilamps with radiation output through side surface ofthe cylinder and through one or two windows placed on the tube ends have been developed. High UV radiation power and electrical power deposition to fluorescence conversion resulted in efficiencies of up to 12%. The study of XeC1, KrCl and XeI excilamps have shown, that it is possible to create sealed-off samples with lifetime more than 1000 hours. The stability of output parameters ofthe capacitive discharge excilamps is studied and the mechanism of chlorine losses in low pressure halogencontaimng excilamps made of quartz was determined. The possibility of creation of capacitive discharge excilamps with short pulse duration was studied. In capacitive discharge cylindrical KrClexcilamp, at λ~222 nm the radiation pulse power up to 2.5 kW was obtained. Powerful radiation pulses 50 ns in duration were obtained at pulse repetition rate of 1 kHz.

Paper Details

Date Published: 7 June 2000
PDF: 7 pages
Proc. SPIE 3933, Laser Applications in Microelectronic and Optoelectronic Manufacturing V, (7 June 2000); doi: 10.1117/12.387580
Show Author Affiliations
Edward A. Sosnin, High Current Electronics Institute (Russia)
Mikhail V. Erofeev, High Current Electronics Institute (Russia)
Alexei N. Panchenko, High Current Electronics Institute (Russia)
Mikhail I. Lomaev, High Current Electronics Institute (Russia)
Victor S. Skakun, High Current Electronics Institute (Russia)
Dmitrii V. Shitz, High Current Electronics Institute (Russia)
Victor F. Tarasenko, High Current Electronics Institute (Russia)


Published in SPIE Proceedings Vol. 3933:
Laser Applications in Microelectronic and Optoelectronic Manufacturing V
Henry Helvajian; Koji Sugioka; Malcolm C. Gower; Jan J. Dubowski, Editor(s)

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