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Proceedings Paper

Measurement of excimer-laser-induced birefringence in fused silica and calcium fluoride
Author(s): Baoliang Bob Wang
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Paper Abstract

Fused silica and calcium fluoride are the standard lens materials for the 193 nm (ArF excimer laser) generation step and scan systems. In this paper, the author reports measurements of induced birefringence in both fused silica and calcium fluoride samples exposed to ArF excimer laser irradiation. A new birefringence measurement instrument, known as the ExicorTM system, was used for mapping birefringent images. Different patterns of induced birefringence in fused silica samples were observed for samples irradiated with 'unpolarized' and polarized excimer lasers. Birefringence induced in fused silica with linearly polarized excimer laser irradiation contradicts the traditional compaction model. The measurement result of a CaF2 element confirms that 193 nm excimer laser irradiation induces no observable birefringence in CaF2.

Paper Details

Date Published: 2 June 2000
PDF: 8 pages
Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); doi: 10.1117/12.386523
Show Author Affiliations
Baoliang Bob Wang, Hinds Instruments, Inc. (United States)

Published in SPIE Proceedings Vol. 3998:
Metrology, Inspection, and Process Control for Microlithography XIV
Neal T. Sullivan, Editor(s)

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