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Proceedings Paper

Automatic macro inspection system
Author(s): Toshiaki Kitamura; Yasuharu Nakajima; Hiroyuki Matsumoto; Takeo Omori; Koichiro Komatsu
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Paper Abstract

Macro defect inspection in the photolithography process has been operated by the operator's naked eye. Operator's inspection performance is not constant and depends on his skill, even if these macro defects are determined as the large scale defect. This paper reports our fully automated macro inspection system and its performance data that were evaluated in the production Fab. Our new system, Nikon AMI-2000, is designed to use the diffraction light imaging which is very effective to detect defocus defects and is designed to use an image processing method. This system has much higher sensitivity than operator inspection, the capability of constant yield management and has a high throughput performance.

Paper Details

Date Published: 2 June 2000
PDF: 7 pages
Proc. SPIE 3998, Metrology, Inspection, and Process Control for Microlithography XIV, (2 June 2000); doi: 10.1117/12.386514
Show Author Affiliations
Toshiaki Kitamura, Nikon Corp. (Japan)
Yasuharu Nakajima, Nikon Corp. (Japan)
Hiroyuki Matsumoto, Nikon Corp. (Japan)
Takeo Omori, Nikon Corp. (Japan)
Koichiro Komatsu, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 3998:
Metrology, Inspection, and Process Control for Microlithography XIV
Neal T. Sullivan, Editor(s)

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